中国物理B ›› 2020, Vol. 29 ›› Issue (2): 28101-028101.doi: 10.1088/1674-1056/ab6586
• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇 下一篇
Cen-Yao Tang(唐岑瑶), Zhi-Cheng Rao(饶志成), Qian-Qian Yuan(袁茜茜), Shang-Jie Tian(田尚杰), Hang Li(李航), Yao-Bo Huang(黄耀波), He-Chang Lei(雷和畅), Shao-Chun Li(李绍春), Tian Qian(钱天), Yu-Jie Sun(孙煜杰), Hong Ding(丁洪)
Cen-Yao Tang(唐岑瑶)1,2, Zhi-Cheng Rao(饶志成)1,2, Qian-Qian Yuan(袁茜茜)3,4, Shang-Jie Tian(田尚杰)5, Hang Li(李航)1,2, Yao-Bo Huang(黄耀波)6, He-Chang Lei(雷和畅)5, Shao-Chun Li(李绍春)3,4, Tian Qian(钱天)1,7, Yu-Jie Sun(孙煜杰)1,7, Hong Ding(丁洪)1,7
摘要: Surface-sensitive measurements are crucial to many types of researches in condensed matter physics. However, it is difficult to obtain atomically flat surfaces of many single crystals by the commonly used mechanical cleavage. We demonstrate that the grind-polish-sputter-anneal method can be used to obtain atomically flat surfaces on topological materials. Three types of surface-sensitive measurements are performed on CoSi (001) surface with dramatically improved quality of data. This method extends the research area of surface-sensitive measurements to hard-to-cleave alloys, and can be applied to irregular single crystals with selective crystalline planes. It may become a routine process of preparing atomically flat surfaces for surface-sensitive technologies.
中图分类号: (Surface cleaning, etching, patterning)