Surface termination effects on the electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition

doi:10.1088/1674-1056/abc0d4

中国物理B ›› 2020, Vol. 29 ›› Issue (11): 117701-.doi: 10.1088/1674-1056/abc0d4

Ji-Bin Fan(樊继斌)¹^,†(), Shan-Ya Ling(凌山雅)¹, Hong-Xia Liu(刘红侠)², Li Duan(段理)¹, Yan Zhang(张研)¹, Ting-Ting Guo(郭婷婷)¹, Xing Wei(魏星)¹, Qing He(何清)¹

收稿日期:2020-05-14 修回日期:2020-09-24 接受日期:2020-10-14 出版日期:2020-11-05 发布日期:2020-11-03

Surface termination effects on the electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition

Ji-Bin Fan(樊继斌)^{1, †}, Shan-Ya Ling(凌山雅)¹, Hong-Xia Liu(刘红侠)², Li Duan(段理)¹, Yan Zhang(张研)¹, Ting-Ting Guo(郭婷婷)¹, Xing Wei(魏星)¹, and Qing He(何清)¹$

1 School of Materials Science and Engineering, Chang’an University, Xi’an 710061, China
2 School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi’an 710071, China

Received:2020-05-14 Revised:2020-09-24 Accepted:2020-10-14 Online:2020-11-05 Published:2020-11-03
Contact: ^†Corresponding author. E-mail: jbfan@chd.edu.cn
Supported by:
the National Natural Science Foundation of China (Grant Nos. 61604016 and 51802025), China Postdoctoral Science Foundation (Grant No. 2017M613028), the Fundamental Research Funds for the Central Universities, China (Grant Nos. 300102319209 and 300102310501) and the Innovation, and Entrepreneurship Training Program for Undergraduates (Grant Nos. 202010710231 and 201910710564).

摘要/Abstract

Abstract:

Effects of initial surface termination on electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition are studied by conductive atomic force microscopy working in contact mode and standard electrical characterization methods. It is found that, compared with La₂O₃/Al₂O₃ nanolaminates with LaO_x as termination, lower interface trap density, less current leakage spots, and higher breakdown voltage are obtained in the La₂O₃/Al₂O₃ nanolaminates with AlO_x as termination after annealing. A clear promotion of interface silicate layer is observed for La₂O₃/Al₂O₃ nanolaminates with AlO_x as termination compared with LaO_x as termination under the same annealing condition. In addition, the current conduction mechanism in La₂O₃/Al₂O₃ nanolaminates is considered as the Poole–Frenkel conduction. All results indicate that the AlO_x is a more appropriate termination to deposit La₂O₃/Al₂O₃ nanolaminates on Si substrate, which is useful for the high-κ process development.

Key words: La₂O₃/Al₂O₃, atomic layer deposition, termination, annealing

Ji-Bin Fan(樊继斌), Shan-Ya Ling(凌山雅), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Ting-Ting Guo(郭婷婷), Xing Wei(魏星), Qing He(何清). [J]. 中国物理B, 2020, 29(11): 117701-.

Ji-Bin Fan(樊继斌), Shan-Ya Ling(凌山雅), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Ting-Ting Guo(郭婷婷), Xing Wei(魏星), and Qing He(何清)$. Surface termination effects on the electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition[J]. Chin. Phys. B, 2020, 29(11): 117701-.

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Surface termination effects on the electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition

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