中国物理B ›› 2016, Vol. 25 ›› Issue (11): 115202-115202.doi: 10.1088/1674-1056/25/11/115202

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

One-dimensional hybrid simulation of the electrical asymmetry effectcaused by the fourth-order harmonic in dual-frequencycapacitively coupled plasma

Shuai Wang(王帅), Hai-Feng Long(龙海凤), Zhen-Hua Bi(毕振华), Wei Jiang(姜巍), Xiang Xu(徐翔), You-Nian Wang(王友年)   

  1. 1 Department of Physics, College of Sciences, Northeastern University, Shenyang 110891, China;
    2 Liaoning Key Lab of Optoelectronic Films & Materials, School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China;
    3 School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China;
    4 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
  • 收稿日期:2016-05-19 修回日期:2016-06-26 出版日期:2016-11-05 发布日期:2016-11-05
  • 通讯作者: Shuai Wang E-mail:s_wang@mail.neu.edu.cn
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 11305032, 11305028, 11375163, and 11275039) and the Scientific Foundation of Ministry of Education of China (Grant No. N130405008).

One-dimensional hybrid simulation of the electrical asymmetry effectcaused by the fourth-order harmonic in dual-frequencycapacitively coupled plasma

Shuai Wang(王帅)1, Hai-Feng Long(龙海凤)1, Zhen-Hua Bi(毕振华)2, Wei Jiang(姜巍)3, Xiang Xu(徐翔)4, You-Nian Wang(王友年)4   

  1. 1 Department of Physics, College of Sciences, Northeastern University, Shenyang 110891, China;
    2 Liaoning Key Lab of Optoelectronic Films & Materials, School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China;
    3 School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China;
    4 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
  • Received:2016-05-19 Revised:2016-06-26 Online:2016-11-05 Published:2016-11-05
  • Contact: Shuai Wang E-mail:s_wang@mail.neu.edu.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 11305032, 11305028, 11375163, and 11275039) and the Scientific Foundation of Ministry of Education of China (Grant No. N130405008).

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摘要： A one-dimensional hybrid model was developed to study the electrical asymmetry effect (EAE) caused by the fourth-order harmonic in a dual-frequency capacitively coupled Ar plasma. The self-bias voltage caused by the fourth-order frequency changes periodically with the phase angle, and the cycle of self-bias with the phase angle is π/2, which is half of that in the second-order case. The influence of the phase angle between the fundamental and its fourth-order frequency on the ion density profiles and the ion energy distributions (IEDs) were studied. Both the ion density profile and the IEDs can be controlled by the phase angle, which provides a convenient way to adjust the sheath characters without changing the main discharge parameters.

关键词: capacitively coupled plasmas, electrical asymmetry effect, Hybrid model, ion energy distributions

Abstract: A one-dimensional hybrid model was developed to study the electrical asymmetry effect (EAE) caused by the fourth-order harmonic in a dual-frequency capacitively coupled Ar plasma. The self-bias voltage caused by the fourth-order frequency changes periodically with the phase angle, and the cycle of self-bias with the phase angle is π/2, which is half of that in the second-order case. The influence of the phase angle between the fundamental and its fourth-order frequency on the ion density profiles and the ion energy distributions (IEDs) were studied. Both the ion density profile and the IEDs can be controlled by the phase angle, which provides a convenient way to adjust the sheath characters without changing the main discharge parameters.

Key words: capacitively coupled plasmas, electrical asymmetry effect, Hybrid model, ion energy distributions

中图分类号:  (Plasma simulation)

  • 52.65.-y
52.80.Pi (High-frequency and RF discharges)