中国物理B ›› 2011, Vol. 20 ›› Issue (6): 68501-068501.doi: 10.1088/1674-1056/20/6/068501

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First principles simulation technique for characterizing single event effects

郭刚1, 闫逸华2, 张科营3, 郭红霞3, 罗尹虹3, 范如玉3, 陈伟3, 林东生3   

  1. (1)China Institute of Atomic Energy, Beijing 102413, China; (2)Department of Engineering Physics, Tsinghua University, Beijing 100084, China; (3)Northwest Institute of Nuclear Techniques, Xián 710024, China
  • 收稿日期:2010-06-17 修回日期:2011-03-14 出版日期:2011-06-15 发布日期:2011-06-15

First principles simulation technique for characterizing single event effects

Zhang Ke-Ying (张科营)a, Guo Hong-Xia (郭红霞)aLuo Yin-Hong (罗尹虹)aFan Ru-Yu (范如玉)aChen Wei (陈伟)aLin Dong-Sheng (林东生)aGuo Gang (郭刚)bYan Yi-Hua (闫逸华)c   

  1. a Northwest Institute of Nuclear Techniques, Xi'an 710024, China; b China Institute of Atomic Energy, Beijing 102413, China; c Department of Engineering Physics, Tsinghua University, Beijing 100084, China
  • Received:2010-06-17 Revised:2011-03-14 Online:2011-06-15 Published:2011-06-15

摘要: This paper develops a new simulation technique to characterize single event effects on semiconductor devices. The technique used to calculate the single event effects is developed according to the physical interaction mechanism of a single event effect. An application of the first principles simulation technique is performed to predict the ground-test single event upset effect on field-programmable gate arrays based on 0.25 μm advanced complementary metal-oxide-semiconductor technology. The agreement between the single event upset cross section accessed from a broad-beam heavy ion experiment and simulation shows that the simulation technique could be used to characterize the single event effects induced by heavy ions on a semiconductor device.

关键词: single event effect, static random access memory, cross section, simulation

Abstract: This paper develops a new simulation technique to characterize single event effects on semiconductor devices. The technique used to calculate the single event effects is developed according to the physical interaction mechanism of a single event effect. An application of the first principles simulation technique is performed to predict the ground-test single event upset effect on field-programmable gate arrays based on 0.25 μm advanced complementary metal-oxide-semiconductor technology. The agreement between the single event upset cross section accessed from a broad-beam heavy ion experiment and simulation shows that the simulation technique could be used to characterize the single event effects induced by heavy ions on a semiconductor device.

Key words: single event effect, static random access memory, cross section, simulation

中图分类号:  (Semiconductor-device characterization, design, and modeling)

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