Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

doi:10.1088/1674-1056/17/11/047

中国物理B ›› 2008, Vol. 17 ›› Issue (11): 4242-4246.doi: 10.1088/1674-1056/17/11/047

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇下一篇

Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

徐旭, 李林森, 刘峰, 周前红, 梁荣庆

Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China

收稿日期:2008-03-02 修回日期:2008-03-12 出版日期:2008-11-20 发布日期:2008-11-20
基金资助:
Project supported by National Natural Science Foundation of China (Grant No 50577009).

Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

Xu Xu (徐旭), Li Lin-Sen (李林森), Liu Feng (刘峰), Zhou Qian-Hong (周前红), Liang Rong-Qing (梁荣庆)

Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, China

Received:2008-03-02 Revised:2008-03-12 Online:2008-11-20 Published:2008-11-20
Supported by:
Project supported by National Natural Science Foundation of China (Grant No 50577009).

摘要/Abstract

摘要： This paper develops a humped spiral antenna of top inductively coupled plasma with variable gap. Comparing with planar spiral antennae, it investigates the performance of humped spiral antennae in the calculated electromagnetic configurations and experimental results. It finds that the humped antenna has the improved uniformity of plasma density in the radial direction and the decreased electron temperature in the top inductively coupled plasma. By experimental and theoretical analyses, the plasma performance in the case of humped antennae is considered to be the combined results of the uniform electromagnetic configurations and the depressed capacitively coupling effect.

Abstract: This paper develops a humped spiral antenna of top inductively coupled plasma with variable gap. Comparing with planar spiral antennae, it investigates the performance of humped spiral antennae in the calculated electromagnetic configurations and experimental results. It finds that the humped antenna has the improved uniformity of plasma density in the radial direction and the decreased electron temperature in the top inductively coupled plasma. By experimental and theoretical analyses, the plasma performance in the case of humped antennae is considered to be the combined results of the uniform electromagnetic configurations and the depressed capacitively coupling effect.

Key words: inductively coupled plasma, Langmuir probe, planar antenna, density uniformity

中图分类号: (Plasma interactions with antennas; plasma-filled waveguides)

52.40.Fd

52.25.-b (Plasma properties) 52.70.Ds (Electric and magnetic measurements)

徐旭, 李林森, 刘峰, 周前红, 梁荣庆. Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna[J]. 中国物理B, 2008, 17(11): 4242-4246.

Xu Xu (徐旭), Li Lin-Sen (李林森), Liu Feng (刘峰), Zhou Qian-Hong (周前红), Liang Rong-Qing (梁荣庆). Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna[J]. Chin. Phys. B, 2008, 17(11): 4242-4246.

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Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

Improving the uniformity of RF-plasma density by a humped variable-gap spiral antenna

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