中国物理B ›› 2001, Vol. 10 ›› Issue (5): 424-428.doi: 10.1088/1009-1963/10/5/312

• • 上一篇    下一篇

GUIDING OF PLASMA BY ELECTRIC FIELD AND MAGNETIC FIELD

侯君达1, 张涛2, 汤宝寅3, 朱剑豪3, I. G. Brown4   

  1. (1)Beijing Radiation Center, Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing 100875, China; (2)Beijing Radiation Center, Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing 100875, China; Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China; (3)Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China; (4)Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
  • 收稿日期:2000-12-22 出版日期:2001-05-15 发布日期:2005-06-12
  • 基金资助:
    Project supported by the Hong Kong Research Grants Council Earmarked Grants 9040412 and 9040344, the Beijing Science and Technology New Star Plan (Grant No.952870400), and the Natural Science Foundation of Beijing, China (Grant No.1002005).

GUIDING OF PLASMA BY ELECTRIC FIELD AND MAGNETIC FIELD

Zhang Tao (张涛)ab, Hou Jun-da (侯君达)a, Tang Bao-yin (汤宝寅)b, P. K. Chu (朱剑豪)b, I. G. Brownc   

  1. a Beijing Radiation Center, Institute of Low Energy Nuclear Physics, Beijing Normal University, Beijing 100875, China; b Department of Physics and Materials Science, City University of Hong Kong, Hong Kong, China; c Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
  • Received:2000-12-22 Online:2001-05-15 Published:2005-06-12
  • Supported by:
    Project supported by the Hong Kong Research Grants Council Earmarked Grants 9040412 and 9040344, the Beijing Science and Technology New Star Plan (Grant No.952870400), and the Natural Science Foundation of Beijing, China (Grant No.1002005).

PDF (PC)

398

赞

摘要： The relationship between the transported ion current and the cathodic arc current is determined in a vacuum arc plasma source equipped with a curved magnetic filter. Our results suggest that the outer and inner walls of the duct interact with the plasma independently. The duct magnetic field is a critical factor of the plasma output. The duct transport efficiency is to maximize at a value of bias plate voltage in the range +10 V to +20 V, and independent (within our limit of measurement) of the magnetic field strength in the duct. The plasma flux is composed of two components: a diffusion flux in the transverse direction due to particle collisions, and a drift flux due to the ion inertia. The inner wall of the magnetic duct sees only the diffusion flux while the outer wall receives both fluxes. Thus, applying a positive potential to the outer duct wall can reflect the ions and increase the output current. Our experimental data also show that biasing both sides of the duct is more effective than biasing the outer wall alone.

Abstract: The relationship between the transported ion current and the cathodic arc current is determined in a vacuum arc plasma source equipped with a curved magnetic filter. Our results suggest that the outer and inner walls of the duct interact with the plasma independently. The duct magnetic field is a critical factor of the plasma output. The duct transport efficiency is to maximize at a value of bias plate voltage in the range +10 V to +20 V, and independent (within our limit of measurement) of the magnetic field strength in the duct. The plasma flux is composed of two components: a diffusion flux in the transverse direction due to particle collisions, and a drift flux due to the ion inertia. The inner wall of the magnetic duct sees only the diffusion flux while the outer wall receives both fluxes. Thus, applying a positive potential to the outer duct wall can reflect the ions and increase the output current. Our experimental data also show that biasing both sides of the duct is more effective than biasing the outer wall alone.

Key words: cathodic arc, plasma, transport, magnetic filter

中图分类号:  (Arcs; sparks; lightning; atmospheric electricity)

  • 52.80.Mg
52.50.Dg (Plasma sources) 52.25.Fi (Transport properties) 52.40.Hf (Plasma-material interactions; boundary layer effects)