Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces

doi:10.1088/1674-1056/25/9/095204

中国物理B ›› 2016, Vol. 25 ›› Issue (9): 95204-095204.doi: 10.1088/1674-1056/25/9/095204

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇下一篇

Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces

Jinghua Han(韩敬华), Li Luo(罗莉), Yubo Zhang(张玉波), Ruifeng Hu(胡锐峰), Guoying Feng(冯国英)

1. College of Electronics and Information Engineering, Sichuan University, Chengdu 610064, China;
2. College of Optoelectronic technology, Chengdu University of Information Technology, Chengdu 610225, China;
3. Sichuan Engineering Technical College, Deyang 618000, China

收稿日期:2016-03-01 修回日期:2016-04-19 出版日期:2016-09-05 发布日期:2016-09-05
通讯作者: Guoying Feng E-mail:guoing_feng@scu.edu.cn,hjhscu@gmail.com
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 11574221).

Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces

Jinghua Han(韩敬华)¹, Li Luo(罗莉)^1,2, Yubo Zhang(张玉波)³, Ruifeng Hu(胡锐峰)¹, Guoying Feng(冯国英)¹

1. College of Electronics and Information Engineering, Sichuan University, Chengdu 610064, China;
2. College of Optoelectronic technology, Chengdu University of Information Technology, Chengdu 610225, China;
3. Sichuan Engineering Technical College, Deyang 618000, China

Received:2016-03-01 Revised:2016-04-19 Online:2016-09-05 Published:2016-09-05
Contact: Guoying Feng E-mail:guoing_feng@scu.edu.cn,hjhscu@gmail.com
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 11574221).

摘要/Abstract

摘要： Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave. The particles and silicon are heated by the irradiation and they will expand differently due to their different expansion coefficients, making the particles easier to be removed. Laser plasma can ionize and even vaporize particles more significantly than an incident laser and, therefore, it can remove the particles more efficiently. The laser plasma shock wave plays a dominant role in removing particles, which is attributed to its strong burst force. The pressure of the laser plasma shock wave is determined by the laser pulse energy and the gap between the focus of laser and substrate surface. In order to obtain the working conditions for particle removal, the removal mechanism, as well as the temporal and spatial characteristics of velocity, propagation distance and pressure of shock wave have been researched. On the basis of our results, the conditions for nano-particle removal are achieved.

关键词: laser-induced plasma, shock wave, nano-particles, surface cleaning

Abstract: Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave. The particles and silicon are heated by the irradiation and they will expand differently due to their different expansion coefficients, making the particles easier to be removed. Laser plasma can ionize and even vaporize particles more significantly than an incident laser and, therefore, it can remove the particles more efficiently. The laser plasma shock wave plays a dominant role in removing particles, which is attributed to its strong burst force. The pressure of the laser plasma shock wave is determined by the laser pulse energy and the gap between the focus of laser and substrate surface. In order to obtain the working conditions for particle removal, the removal mechanism, as well as the temporal and spatial characteristics of velocity, propagation distance and pressure of shock wave have been researched. On the basis of our results, the conditions for nano-particle removal are achieved.

Key words: laser-induced plasma, shock wave, nano-particles, surface cleaning

中图分类号: (Plasma-material interactions; boundary layer effects)

52.40.Hf

62.50.-p (High-pressure effects in solids and liquids) 79.20.Ds (Laser-beam impact phenomena) 52.50.Lp (Plasma production and heating by shock waves and compression)

韩敬华, 罗莉, 张玉波, 胡锐峰, 冯国英. Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces[J]. 中国物理B, 2016, 25(9): 95204-095204.

Jinghua Han(韩敬华), Li Luo(罗莉), Yubo Zhang(张玉波), Ruifeng Hu(胡锐峰), Guoying Feng(冯国英). Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces[J]. Chin. Phys. B, 2016, 25(9): 95204-095204.

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Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces

Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces

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