Formation of epitaxial Tl2Ba2Ca2Cu3O10 superconducting films by dc-magnetron sputtering and triple post-annealing method

doi:10.1088/1674-1056/23/7/077401

›› 2014, Vol. 23 ›› Issue (7): 77401-077401.doi: 10.1088/1674-1056/23/7/077401

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇下一篇

Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method

解伟^a, 王培^a, 季鲁^a, 葛德永^a, 杜佳男^a, 高晓昕^a, 刘欣^a, 宋凤斌^b, 胡磊^a, 张旭^a, 何明^a, 赵新杰^a

a College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300071, China;
b The 10th institute of Chinese Electronic Technology Corporation, Chengdu 610036, China

收稿日期:2013-08-09 修回日期:2014-01-02 出版日期:2014-07-15 发布日期:2014-07-15
基金资助:
Project supported by the National Natural Science Foundation of China (Grant Nos. 51002081 and 61176119).

Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method

Xie Wei (解伟)^a, Wang Pei (王培)^a, Ji Lu (季鲁)^a, Ge De-Yong (葛德永)^a, Du Jia-Nan (杜佳男)^a, Gao Xiao-Xin (高晓昕)^a, Liu Xin (刘欣)^a, Song Feng-Bin (宋凤斌)^b, Hu Lei (胡磊)^a, Zhang Xu (张旭)^a, He Ming (何明)^a, Zhao Xin-Jie (赵新杰)^a

a College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300071, China;
b The 10th institute of Chinese Electronic Technology Corporation, Chengdu 610036, China

Received:2013-08-09 Revised:2014-01-02 Online:2014-07-15 Published:2014-07-15
Contact: Zhao Xin-Jie E-mail:zhaoxj@nankai.edu.cn
About author:74.78.-w
Supported by:
Project supported by the National Natural Science Foundation of China (Grant Nos. 51002081 and 61176119).

摘要/Abstract

摘要： For obtaining pure phase Tl₂Ba₂Ca₂Cu₃O₁₀ (Tl-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, Tl₂Ba₂CaCu₂O₈ (Tl-2212) is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared Tl-2212 inter-phase is converted into Tl-2223 phase. An additional annealing in oxygen is also adopted to improve the properties of Tl-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction (XRD) θ -2θ scans, ω scans and rotational ø scans show that each of the Tl-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy (SEM). The critical temperatures T_c of the films are measured to be about 120 K and the critical current densities J_c can reach 4.0 MA/cm² at 77 K at self field.

关键词: Tl-2223 superconducting films, post-annealing, critical temperature, critical current density

Abstract: For obtaining pure phase Tl₂Ba₂Ca₂Cu₃O₁₀ (Tl-2223) films with good superconducting properties, the growth technique is improved by dc magnetron sputtering and a triple post-annealing process. The triple post-annealing process comprises annealing twice in argon and once in oxygen at different temperatures. In the first low-temperature annealing phase in argon, Tl₂Ba₂CaCu₂O₈ (Tl-2212) is obtained to effectively minimize evaporation in the next step. With the increase of temperature in the second annealing stage in argon, the previously prepared Tl-2212 inter-phase is converted into Tl-2223 phase. An additional annealing in oxygen is also adopted to improve the properties of Tl-2223 films, each containing an optimal oxygen content value. The results of X-ray diffraction (XRD) θ -2θ scans, ω scans and rotational ø scans show that each of the Tl-2223 films has a high phase purity and an epitaxial structure. Smooth films are observed by scanning electron microscopy (SEM). The critical temperatures T_c of the films are measured to be about 120 K and the critical current densities J_c can reach 4.0 MA/cm² at 77 K at self field.

Key words: Tl-2223 superconducting films, post-annealing, critical temperature, critical current density

中图分类号: (Superconducting films and low-dimensional structures)

74.78.-w

解伟, 王培, 季鲁, 葛德永, 杜佳男, 高晓昕, 刘欣, 宋凤斌, 胡磊, 张旭, 何明, 赵新杰. Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method[J]. , 2014, 23(7): 77401-077401.

Xie Wei (解伟), Wang Pei (王培), Ji Lu (季鲁), Ge De-Yong (葛德永), Du Jia-Nan (杜佳男), Gao Xiao-Xin (高晓昕), Liu Xin (刘欣), Song Feng-Bin (宋凤斌), Hu Lei (胡磊), Zhang Xu (张旭), He Ming (何明), Zhao Xin-Jie (赵新杰). Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method[J]. Chin. Phys. B, 2014, 23(7): 77401-077401.

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Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method

Formation of epitaxial Tl₂Ba₂Ca₂Cu₃O₁₀ superconducting films by dc-magnetron sputtering and triple post-annealing method

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