中国物理B ›› 2014, Vol. 23 ›› Issue (11): 117102-117102.doi: 10.1088/1674-1056/23/11/117102
• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇 下一篇
李春霞a b c, 党随虎a b c, 王丽萍a b, 张彩丽a b, 韩培德a b
Li Chun-Xia (李春霞)a b c, Dang Sui-Hu (党随虎)a b c, Wang Li-Ping (王丽萍)a b, Zhang Cai-Li (张彩丽)a b, Han Pei-De (韩培德)a b
摘要:
We analyze the influences of interstitial atoms on the generalized stacking fault energy (GSFE), strength, and ductility of Ni by first-principles calculations. Surface energies and GSFE curves are calculated for the <112> (111) and <101> (111) systems. Because of the anisotropy of the single crystal, the addition of interstitials tends to promote the strength of Ni by slipping along the <101> direction while facilitating plastic deformation by slipping along the <112> direction. There is a different impact on the mechanical behavior of Ni when the interstitials are located in the slip plane. The evaluation of the Rice criterion reveals that the addition of the interstitials H and O increases the brittleness in Ni and promotes the probability of cleavage fracture, while the addition of S and N tends to increase the ductility. Besides, P, H, and S have a negligible effect on the deformation tendency in Ni, while the tendency of partial dislocation is more prominent with the addition of N and O. The addition of interstitial atoms tends to increase the high-energy barrier γmax, thereby the second partial resulting from the dislocation tends to reside and move on to the next layer.
中图分类号: (Density functional theory, local density approximation, gradient and other corrections)