Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

doi:10.1088/1674-1056/19/3/035201

中国物理B ›› 2010, Vol. 19 ›› Issue (3): 35201-035201.doi: 10.1088/1674-1056/19/3/035201

Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

刘成森¹, 韩宏颖¹, 彭晓晴¹, 昶叶¹, 王德真²

(1)College of Physics and Electronic Technology, Liaoning Normal University, Dalian 116029, China; (2)State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116023, China

收稿日期:2009-07-03 修回日期:2009-08-13 出版日期:2010-03-15 发布日期:2010-03-15
基金资助:
Project supported by the Program for Innovative Research Team of High Education in Liaoning Province, China (Grant No. 2009T055).

Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

Liu Cheng-Sen(刘成森)^a)^†, Han Hong-Ying(韩宏颖)^a), Peng Xiao-Qing(彭晓晴)^a), Chang Ye(昶叶)^a), and Wang De-Zhen(王德真)^b)

^a College of Physics and Electronic Technology, Liaoning Normal University, Dalian 116029, China; ^b State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116023, China

Received:2009-07-03 Revised:2009-08-13 Online:2010-03-15 Published:2010-03-15
Supported by:
Project supported by the Program for Innovative Research Team of High Education in Liaoning Province, China (Grant No. 2009T055).

摘要/Abstract

摘要： A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis.

Abstract: A two-dimensional particle-in-cell simulation is used to study the time-dependent evolution of the sheath surrounding a prolate spheroid target during a high voltage pulse in plasma source ion implantation. Our study shows that the potential contour lines pack more closely in the plasma sheath near the vertex of the major axis, i.e. where a thinner sheath is formed, and a non-uniform total ion dose distribution is incident along the surface of the prolate spheroid target due to the focusing of ions by the potential structure. Ion focusing takes place not only at the vertex of the major axis, where dense potential contour lines exist, but also at the vertex of the minor axis, where sparse contour lines exist. This results in two peaks of the received ion dose, locating at the vertices of the major and minor axes of the prolate spheroid target, and an ion dose valley, staying always between the vertices, rather than at the vertex of the minor axis.

Key words: plasma source ion implantation, ion sheath, two-dimensional particle-in-cell model, Ion dose

中图分类号: (Particle-in-cell method)

52.65.Rr

52.40.Kh (Plasma sheaths) 52.77.Dq (Plasma-based ion implantation and deposition)

刘成森, 韩宏颖, 彭晓晴, 昶叶, 王德真. Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target[J]. 中国物理B, 2010, 19(3): 35201-035201.

Liu Cheng-Sen(刘成森), Han Hong-Ying(韩宏颖), Peng Xiao-Qing(彭晓晴), Chang Ye(昶叶), and Wang De-Zhen(王德真). Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target[J]. Chin. Phys. B, 2010, 19(3): 35201-035201.

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Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target

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