中国物理B ›› 2010, Vol. 19 ›› Issue (3): 34202-034202.doi: 10.1088/1674-1056/19/3/034202
陈健, 王庆康, 李海华
Chen Jian(陈健), Wang Qing-Kang(王庆康),† and Li Hai-Hua(李海华)
摘要: A far-field optical lithography is developed in this paper. By designing the structure of a far-field optical superlens, lithographical resolution can be improved by using a conventional UV light source. The finite different time domain numerical studies indicate that the lithographic resolution at 50~nm line width is achievable with the structure shown in this paper by using 365~nm wavelength light, and the light can be transferred to a far distance in the photoresist.
中图分类号: (Lenses, prisms and mirrors)