中国物理B ›› 2010, Vol. 19 ›› Issue (11): 114203-114206.doi: 10.1088/1674-1056/19/11/114203

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Research of photolithography technology based on surface plasmon

李海华, 陈健, 王庆康   

  1. National Key Laboratory of Micro/Nano Fabrication Technology, Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
  • 收稿日期:2009-09-24 修回日期:2010-05-11 出版日期:2010-11-15 发布日期:2010-11-15
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No. 60808014), the Shanghai Committee of Science and Technology of China (Grant No. 0852nm06600).

Research of photolithography technology based on surface plasmon

Li Hai-Hua(李海华)†, Chen Jian(陈健), and Wang Qing-Kang(王庆康)   

  1. National Key Laboratory of Micro/Nano Fabrication Technology, Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, China
  • Received:2009-09-24 Revised:2010-05-11 Online:2010-11-15 Published:2010-11-15
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No. 60808014), the Shanghai Committee of Science and Technology of China (Grant No. 0852nm06600).

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摘要： This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employing surface plasmon character. The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask. According to the traditional semiconductor process, the grating structures are fabricated at exposing wavelength of 436 nm. At the same time, it provides additional and quantitative support of this technique based on the finite-difference time-domain method. The results of the research show that surface plasmon characteristics of metals can be used to increase the optical field energy distribution differences through the silica structures with silver film, which directly impact on the exposure of following photosensitive layer in different regions.

Abstract: This paper demonstrates a new process of the photolithography technology, used to fabricate simply fine patterns, by employing surface plasmon character. The sub-wavelength periodic silica structures with uniform silver film are used as the exposure mask. According to the traditional semiconductor process, the grating structures are fabricated at exposing wavelength of 436 nm. At the same time, it provides additional and quantitative support of this technique based on the finite-difference time-domain method. The results of the research show that surface plasmon characteristics of metals can be used to increase the optical field energy distribution differences through the silica structures with silver film, which directly impact on the exposure of following photosensitive layer in different regions.

Key words: surface plasmons, lithography, finite-difference time-domain, sub-wavelength periodic structure

中图分类号:  (Gratings)

  • 42.79.Dj
42.82.Cr (Fabrication techniques; lithography, pattern transfer) 73.20.Mf (Collective excitations (including excitons, polarons, plasmons and other charge-density excitations))