中国物理B ›› 2008, Vol. 17 ›› Issue (7): 2655-2661.doi: 10.1088/1674-1056/17/7/050
施思齐1, 田中真悟2, 香山正憲2
Shi Si-Qi(施思齐)a)b)†, Tanaka Shingo (田中真悟)b), and Kohyama Masanori(香山正憲)b)
摘要: In this paper first-principles calculations of Ni(111)/$\alpha $-Al$_{2}$O$_{3}$(0001) interfaces have been performed, and are compared with the preceding results of the Cu (111)/$\alpha $-Al$_{2}$O$_{3}$(0001) interface [2004 {\em Phil. Mag. Lett.} \textbf{84} 425]. The Al-terminated and O-terminated interfaces have quite different adhesion mechanisms, which are similar to the Cu(111)/$\alpha $-Al$_{2}$O$_{3}$(0001) interface. For the O-terminated interface, the adhesion is caused by the strong O-2p/Ni-3d orbital hybridization and ionic interactions. On the other hand, the adhesion nature of the Al-terminated interface is the image-like electrostatic and Ni--Al hybridization interactions, the latter is substantial and cannot be neglected. Charge transfer occurs from Al$_{2}$O$_{3}$ to Ni, which is opposite to that in the O-terminated interface. The charge transfer direction for the Al-terminated and O-terminated Ni(111)/$\alpha$-Al$_{2}$O$_{3}$(0001) interfaces is similar to that in the corresponding Cu(111)/$\alpha$-Al$_{2}$O$_{3}$(0001) interface, but there exist the larger charge transfer quantity and consequent stronger adhesion nature, respectively.
中图分类号: (Surface states, band structure, electron density of states)