中国物理B ›› 2006, Vol. 15 ›› Issue (5): 1022-1027.doi: 10.1088/1009-1963/15/5/026

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Direct acceleration of electrons using two crossed Laguerre--Gaussian laser beams in vacuum

赵志国1, 吕百达2   

  1. (1)Department of Physics, Luoyang Normal College, Luoyang 471022, China;Institute of Laser Physics and Chemistry, Sichuan University,Chengdu 610064, China; (2)Institute of Laser Physics and Chemistry, Sichuan University,Chengdu 610064, China
  • 收稿日期:2005-11-24 修回日期:2005-12-04 出版日期:2006-05-20 发布日期:2006-05-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No 10574097).

Direct acceleration of electrons using two crossed Laguerre--Gaussian laser beams in vacuum

Zhao Zhi-Guo (赵志国)ab, Lü Bai-Da (吕百达)b   

  1. a Department of Physics, Luoyang Normal College, Luoyang 471022, China; b Institute of Laser Physics and Chemistry, Sichuan University, Chengdu 610064, China
  • Received:2005-11-24 Revised:2005-12-04 Online:2006-05-20 Published:2006-05-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No 10574097).

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摘要： The basic physical characteristics of electrons accelerated by two linearly polarized and circularly symmetric crossed Laguerre--Gaussian (LG) laser beams with equal frequency and amplitude in vacuum are studied in detail. The condition, under which electrons can be accelerated effectively, and the energy gain are discussed.

关键词: electron acceleration, crossed Laguerre--Gaussian (LG) beams, slippage distance, energy gain

Abstract: The basic physical characteristics of electrons accelerated by two linearly polarized and circularly symmetric crossed Laguerre--Gaussian (LG) laser beams with equal frequency and amplitude in vacuum are studied in detail. The condition, under which electrons can be accelerated effectively, and the energy gain are discussed.

Key words: electron acceleration, crossed Laguerre--Gaussian (LG) beams, slippage distance, energy gain

中图分类号:  (Beam characteristics: profile, intensity, and power; spatial pattern formation)

  • 42.60.Jf