中国物理B ›› 2003, Vol. 12 ›› Issue (1): 55-59.doi: 10.1088/1009-1963/12/1/310

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Characteristics of ultrafast K line hard x-ray source from femtosecond terawatt laser-produced plasma

陈 敏2, 高鸿奕3, 陆培祥3, 徐至展3   

  • 收稿日期:2002-01-02 修回日期:2002-09-27 出版日期:2003-01-20 发布日期:2003-01-20
  • 基金资助:
    Project supported by the Special Foundation for State Major Basic Research Program of China (Grant No G1999075200).

Characteristics of ultrafast K line hard x-ray source from femtosecond terawatt laser-produced plasma

Chen Min (陈 敏)ab, Chen Jian-Wen (陈建文)b, Gao Hong-Yi (高鸿奕)b, Lu Pei-Xiang (陆培祥)b, Xu Zhi-Zhan (徐至展)b   

  1. a Shanghai Institute of Nuclear Research, Chinese Academy of Sciences, Shanghai 201800, China; b Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • Received:2002-01-02 Revised:2002-09-27 Online:2003-01-20 Published:2003-01-20
  • Supported by:
    Project supported by the Special Foundation for State Major Basic Research Program of China (Grant No G1999075200).

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摘要： Theoretical studies and analytical scalings were carried out to find the optimized laser parameters and target conditions so that ultrashort hard x-ray pulses and high x-ray power could be achieved. The dependence of laser intensity and wavelength on the yield of $K$-shell x-ray emission was studied. We propose an optimal design for a foil target for producing high-yield hard x-ray pulses of customizing duration.

Abstract: Theoretical studies and analytical scalings were carried out to find the optimized laser parameters and target conditions so that ultrashort hard x-ray pulses and high x-ray power could be achieved. The dependence of laser intensity and wavelength on the yield of $K$-shell x-ray emission was studied. We propose an optimal design for a foil target for producing high-yield hard x-ray pulses of customizing duration.

Key words: ultrafast K line x-ray source, femtosecond laser-produced plasma

中图分类号:  (Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.))

  • 52.50.Jm
42.55.Vc (X- and γ-ray lasers) 78.70.Dm (X-ray absorption spectra) 42.60.Jf (Beam characteristics: profile, intensity, and power; spatial pattern formation)