中国物理B ›› 2001, Vol. 10 ›› Issue (2): 121-123.doi: 10.1088/1009-1963/10/2/307
吕兰斌1, 陈宏智1, 曲昌智1, 汤俊雄1, 陆沅2, 李春勇2, 张燕峰2, 黄绮2, 傅盘铭2, 张治国2
Lu Yuan (陆沅)a, Li Chun-yong (李春勇)a, Zhang Yan-feng (张燕峰)a, Huang Qi (黄绮)a, Fu Pan-ming (傅盘铭)a, Zhang Zhi-guo (张治国)a, Lü Lan-bin (吕兰斌)b, Chen Hong-zhi (陈宏智)b, Qu Chang-zhi (曲昌智)b, Tang Jun-xiong (汤俊雄)b
摘要: We investigate the relationship between the beam intensity and the four-wave mixing diffraction efficiency of longitudinal-field multiple-quantum-well(LMQW) photorefractive device grown at low temperature. The optimum beam intensity is found. We also explain the different mechanisms of the effect of beam intensity on the diffraction efficiency of the LMQW device and the transverse-field MQW device. Some advice on how to improve the diffraction efficiency is given.
中图分类号: (Phase conjugation; photorefractive and Kerr effects)