Cite this article:
Jiayi Qiu, Jinling Yu, Zhu Diao, Yunfeng Lai, Shuying Cheng, Yonghai Chen, Ke He. Thickness dependence of linearly polarized light-induced momentum anisotropy and inverse spin Hall effect in topological insulator Bi2Te3J. Chin. Phys. B, 2025, 34(11): 117103.
| Jiayi Qiu, Jinling Yu, Zhu Diao, Yunfeng Lai, Shuying Cheng, Yonghai Chen, Ke He. Thickness dependence of linearly polarized light-induced momentum anisotropy and inverse spin Hall effect in topological insulator Bi2Te3J. Chin. Phys. B, 2025, 34(11): 117103. |
Thickness dependence of linearly polarized light-induced momentum anisotropy and inverse spin Hall effect in topological insulator Bi2Te3
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Abstract
The thickness dependence of linearly polarized light-induced momentum anisotropy and the inverse spin Hall effect (PISHE) in topological insulator (TI) Bi2Te3 films has been investigated. A significant enhancement of the PISHE signal is observed in the 12-quintuple-layer (QL) Bi2Te3 film compared with that of the 3- and 5-QL samples, whereas a minimal value of photoinduced momentum anisotropy is found in the 12-QL sample. The photoinduced momentum anisotropy and the PISHE in Bi2Te3 films are more than three and two orders of magnitude larger than those in Bi2Se3 films grown on SrTiO3 substrates, respectively. The 3-QL sample exhibits a sinusoidal dependence of the PISHE current on the light spot position, while the 5-QL and 12-QL samples show a W-shaped dependence, which arises from the different angles between the coordinate axis x and the in-plane crystallographic axis of the Bi2Te3 films. Our findings demonstrate the critical role of film thickness in modulating both the photoinduced momentum anisotropy and the PISHE current, thereby suggesting a thickness-engineering strategy for designing novel optoelectronic devices based on TIs. -
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