Relation of V/III ratio of AlN interlayer with the polarity of nitride

N-polar GaN film was obtained by using a high-temperature AlN buffer layer. It was found that the polarity could be inverted by a thin low-temperature AlN interlayer with the same V/III ratio as that of the high-temperature AlN layer. Continuing to increase the V/III ratio of the low-temperature AlN interlayer, the Ga-polarity of GaN film was inverted to N-polarity again but the crystal quality and surface roughness of GaN film greatly deteriorated. Finally, we analyzed the chemical environment of the AlN layer by x-ray photoelectron spectroscopy (XPS), which provides a new direction for the control of GaN polarity.