Cite this article:
Yanxu Chen, Dongliang Xu, Kaikai Xu, Ning Zhang, Siyang Liu, Jianming Zhao, Qian Luo, Lukas W. Snyman, Jacobus W. Swart. Optoelectronic properties analysis of silicon light-emitting diode monolithically integrated in standard CMOS ICJ. Chin. Phys. B, 2019, 28(10): 107801.
| Yanxu Chen, Dongliang Xu, Kaikai Xu, Ning Zhang, Siyang Liu, Jianming Zhao, Qian Luo, Lukas W. Snyman, Jacobus W. Swart. Optoelectronic properties analysis of silicon light-emitting diode monolithically integrated in standard CMOS ICJ. Chin. Phys. B, 2019, 28(10): 107801. |
Optoelectronic properties analysis of silicon light-emitting diode monolithically integrated in standard CMOS IC
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Abstract
Si p+n junction diodes operating in the mode of avalanche breakdown are capable of emitting light in the visible range of 400-900 nm. In this study, to realize the switching speed in the GHz range, we present a transient model to shorten the carrier lifetime in the high electric field region by accumulating carriers in both p and n type regions. We also verify the optoelectronic characteristics by disclosing the related physical mechanisms behind the light emission phenomena. The emission of visible light by a monolithically integrated Si diode under the reverse bias is also discussed. The light is emitted as spatial sources by the defects located at the p-n junction of the reverse-biased diode. The influence of the defects on the electrical behavior is manifested as a current-dependent electroluminescence. -
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