Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Qin Jun-Rui, Chen Shu-Ming, Li Da-Wei, Liang Bin, Liu Bi-Wei. Temperature and drain bias dependence of single event transient in 25-nm FinFET technologyJ. Chin. Phys. B, 2012, 21(8): 089401.
    Qin Jun-Rui, Chen Shu-Ming, Li Da-Wei, Liang Bin, Liu Bi-Wei. Temperature and drain bias dependence of single event transient in 25-nm FinFET technologyJ. Chin. Phys. B, 2012, 21(8): 089401.
  • Temperature and drain bias dependence of single event transient in 25-nm FinFET technology

    • In this paper, we investigate the temperature and drain bias dependency of single event transient (SET) in 25-nm fin field-effect-transistor (FinFET) technology in a temperature range of 0-135 ℃ and supply voltage range of 0.4 V-1.6 V. Technology computer-aided design (TCAD) three-dimensional simulation results show that the drain current pulse duration increases from 0.6 ns to 3.4 ns when the temperature increases from 0 to 135 ℃. The charge collected increases from 45.5 fC to 436.9 fC and the voltage pulse width decreases from 0.54 ns to 0.18 ns when supply voltage increases from 0.4 V to 1.6 V. Furthermore, simulation results and the mechanism of temperature and bias dependency are discussed.
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