Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Ma Zhong-Fa, Zhang Peng, Wu Yong, Li Wei-Hua, Zhuang Yi-Qi, Du Lei. Accurate extraction of trap depth responsible for RTS noise in nano-MOSFETsJ. Chin. Phys. B, 2010, 19(3): 037201.
    Ma Zhong-Fa, Zhang Peng, Wu Yong, Li Wei-Hua, Zhuang Yi-Qi, Du Lei. Accurate extraction of trap depth responsible for RTS noise in nano-MOSFETsJ. Chin. Phys. B, 2010, 19(3): 037201.
  • Accurate extraction of trap depth responsible for RTS noise in nano-MOSFETs

    • This paper presents an accurate analytical model of the random telegraph signal (RTS) noise time-constant ratio (\bar\tau_\rm c/\bar\tau_\rm e) for RTS noise in nano-MOSFETs, in which the Coulomb-blockade effect on trapping and detrapping processes was taken into account. Based on this new model, the depth of the trap responsible for RTS noise in a sample n-type nano-MOSFET is extracted. The results show that large errors will be introduced to the calculated trap depth when the Coulomb-blockade effect is neglected.
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