THE CRYSTALLIZATION OF Bi IN THE ANNEALED a-Ge/Bi BILAYER AND ITS EFFECT ON CONDUCTIVITY

In this paper, the crystallization behaviors and transport properties are investigated for a-Ge/Bi bilayers annealed at different temperatures. For 200nm/100nm bilayers, it is found that the orientations of Bi in the bilayers annealed at 200℃ and 340℃ are preferred, as well as the original one. But they are random when the bilayers are annealed at tem-peratures between 240℃ and 300℃. For 200nm/50nm bilayers, the orientation of Bi are always preferred. Corresponding to the orientations mentioned above, the minimum on the R(300K)-T_a curve appears only in the case of 200nm/100 nm bilayers.