Cite this article:
Wang Tai-hong, Li Hong-wei, Zhou Jun-ming. SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONSJ. Chin. Phys. B, 2001, 10(13): 1-3.
| Wang Tai-hong, Li Hong-wei, Zhou Jun-ming. SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONSJ. Chin. Phys. B, 2001, 10(13): 1-3. |
SINGLE-ELECTRON TRANSISTORS FOR FUTURE APPLICATIONS
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Abstract
Single electron transistors with wire channels are fabricated by a nanoelectrode-pair technique. Their characteristics strongly depend on the channel widths and the voltages on the in-plane gates. A few dips in the Coulomb blockade oscillations were observed at the less positive gate voltages for a device with a 70nm-wide wire due to Coulomb blockade between the coupled dots. By applying negative voltages to the in-plane gates, the oscillations became periodic, which indicated the formation of a single dot in the conducting channel. These gates facilitate fabricating single-electron transistors with single dot structures, which have potential applications on its integration. -
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