Cite this article:
Liping Fu, Gaoyuan Pan, Rui Hao, Xiaolong Fan, Yingtao Li. CMOS compatibility and excellent resistive switching of tantalum oxide-based resistive switching memoryJ. Chin. Phys. B, 2025, 34(7): 077201.
| Liping Fu, Gaoyuan Pan, Rui Hao, Xiaolong Fan, Yingtao Li. CMOS compatibility and excellent resistive switching of tantalum oxide-based resistive switching memoryJ. Chin. Phys. B, 2025, 34(7): 077201. |
CMOS compatibility and excellent resistive switching of tantalum oxide-based resistive switching memory
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Abstract
A CMOS compatible RRAM device with TaN/Ta/TaOx/TaN structure was proposed for nonvolatile memory applications. Excellent resistive switching characteristics, including low operation voltages (< 1 V), low operation current (< 100 μA), good programming/erasing endurance (> 106 cycles), satisfactory uniformity, and reliable data retention, have been demonstrated. Furthermore, all of the elements in the fabricated TaN/Ta/TaOx/TaN devices are highly compatible with modern CMOS manufacturing process, showing promising application in the next generation of nonvolatile memory. -
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