Effects of notch structures on DC and RF performances of AlGaN/GaN high electron mobility transistors

The effects of various notch structures on direct current (DC) and radio frequency (RF) performances of AlGaN/GaN high electron mobility transistors (HEMTs) are analyzed. The AlGaN/GaN HEMTs, each with a 0.8-μm gate length, 50-μm gate width, and 3-μm source-drain distance in various notch structures at the AlGaN/GaN barrier layer, are manufactured to achieve the desired DC and RF characteristics. The maximum drain current (I _ds,max), pinch-off voltage (V _th), maximum transconductance (g _m), gate voltage swing (GVS), subthreshold current, gate leakage current, pulsed I-V characteristics, breakdown voltage, cut-off frequency (f _T), and maximum oscillation frequency (f_max) are investigated. The results show that the double-notch structure HEMT has a 30% improvement of gate voltage swing, a 42.2% improvement of breakdown voltage, and a 9% improvement of cut-off frequency compared with the conventional HEMT. The notch structure also has a good suppression of the current collapse.