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    Zeng Liu, Pei-Gang Li, Yu-Song Zhi, Xiao-Long Wang, Xu-Long Chu, Wei-Hua Tang. Review of gallium oxide based field-effect transistors and Schottky barrier diodesJ. Chin. Phys. B, 2019, 28(1): 017105.
    Zeng Liu, Pei-Gang Li, Yu-Song Zhi, Xiao-Long Wang, Xu-Long Chu, Wei-Hua Tang. Review of gallium oxide based field-effect transistors and Schottky barrier diodesJ. Chin. Phys. B, 2019, 28(1): 017105.
  • Review of gallium oxide based field-effect transistors and Schottky barrier diodes

    • Gallium oxide (Ga2O3), a typical ultra wide bandgap semiconductor, with a bandgap of~4.9 eV, critical breakdown field of 8 MV/cm, and Baliga's figure of merit of 3444, is promising to be used in high-power and high-voltage devices. Recently, a keen interest in employing Ga2O3 in power devices has been aroused. Many researches have verified that Ga2O3 is an ideal candidate for fabricating power devices. In this review, we summarized the recent progress of field-effect transistors (FETs) and Schottky barrier diodes (SBDs) based on Ga2O3, which may provide a guideline for Ga2O3 to be preferably used in power devices fabrication.
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