Time-dependent crosstalk effects for image sensors with different isolation structures

Photo-generated carriers may diffuse into the adjacent cells to form the electrical crosstalk, which is especially noticeable after the pixel cell size has been scaled down. The electrical crosstalk strongly depends on the structure and electrical properties of the photosensitive areas. In this work, time-dependent crosstalk effects considering different isolation structures are investigated. According to the different depths of photo-diode (PD) and isolation structure, the transport of photo-generated carriers is analyzed with different regions in the pixel cell. The evaluation of crosstalk is influenced by exposure time. Crosstalk can be suppressed by reducing the exposure time. However, the sensitivity and dynamic range of the image sensor need to be considered as well.