Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Shaoyan Di, Lei Shen, Zhiyuan Lun, Pengying Chang, Kai Zhao, Tiao Lu, Gang Du, Xiaoyan Liu. Investigation of the surface orientation influence on 10-nm double gate GaSb nMOSFETsJ. Chin. Phys. B, 2017, 26(4): 047201.
    Shaoyan Di, Lei Shen, Zhiyuan Lun, Pengying Chang, Kai Zhao, Tiao Lu, Gang Du, Xiaoyan Liu. Investigation of the surface orientation influence on 10-nm double gate GaSb nMOSFETsJ. Chin. Phys. B, 2017, 26(4): 047201.
  • Investigation of the surface orientation influence on 10-nm double gate GaSb nMOSFETs

    • The performance of double gate GaSb nMOSFETs with surface orientations of (100) and (111) are compared by deterministically solving the time-dependent Boltzmann transport equation (BTE). Results show that the on-state current of the device with (111) surface orientation is almost three times larger than the (100) case due to the higher injection velocity. Moreover, the scattering rate of the (111) device is slightly lower than that of the (100) device.
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