Numerical simulation of the magnetoresistance effect controlled by electric field in p-n junction

The magnetoresistance effect of a p-n junction under an electric field which is introduced by the gate voltage at room temperature is investigated by simulation. As auxiliary models, the Lombardi CVT model and carrier generation-recombination model are introduced into a drift-diffusion transport model and carrier continuity equations. All the equations are discretized by the finite-difference method and the box integration method and then solved by Newton iteration. Taking advantage of those models and methods, an abrupt junction with uniform doping is studied systematically, and the magnetoresistance as a function of doping concentration, SiO₂ thickness and geometrical size is also investigated. The simulation results show that the magnetoresistance (MR) can be controlled substantially by the gate and is dependent on the polarity of the magnetic field.