Cite this article:
Zhai Dong-Yuan, Zhu Jun, Zhao Yi, Cai Yin-Fei, Shi Yi, Zheng You-Liao. High performance trench MOS barrier Schottky diode with high-k gate oxideJ. Chin. Phys. B, 2015, 24(7): 077201.
| Zhai Dong-Yuan, Zhu Jun, Zhao Yi, Cai Yin-Fei, Shi Yi, Zheng You-Liao. High performance trench MOS barrier Schottky diode with high-k gate oxideJ. Chin. Phys. B, 2015, 24(7): 077201. |
High performance trench MOS barrier Schottky diode with high-k gate oxide
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Abstract
A novel trench MOS barrier Schottky diode (TMBS) device with a high-k material introduced into the gate insulator is reported, which is named high-k TMBS. By simulation with Medici, it is found that the high-k TMBS can have 19.8% lower leakage current while maintaining the same breakdown voltage and forward turn-on voltage compared with the conventional regular trench TMBS. -
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