Cite this article:
Tan Shao-Yang, Zhai Teng, Zhang Rui-Kang, Lu Dan, Wang Wei, Ji Chen. Graded doping low internal loss 1060-nm InGaAs/AlGaAsquantum well semiconductor lasersJ. Chin. Phys. B, 2015, 24(6): 064211.
| Tan Shao-Yang, Zhai Teng, Zhang Rui-Kang, Lu Dan, Wang Wei, Ji Chen. Graded doping low internal loss 1060-nm InGaAs/AlGaAsquantum well semiconductor lasersJ. Chin. Phys. B, 2015, 24(6): 064211. |
Graded doping low internal loss 1060-nm InGaAs/AlGaAsquantum well semiconductor lasers
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Abstract
Internal loss is a key internal parameter for high power 1060-nm InGaAs/AlGaAs semiconductor laser. In this paper, we discuss the origin of internal loss of 1060-nm InGaAs/GaAs quantum well (QW) AlGaAs separate confinement heterostructure semiconductor laser, and the method to reduce internal loss. By light doping the n-cladding layer, and stepwise doping the p-cladding layer combined with the expanded waveguide layer, a broad area laser with internal loss of 1/cm is designed and fabricated. Ridge waveguide laser with an output power of 350 mW is obtained. The threshold current and slope efficiency near the threshold current are 20 mA and 0.8 W/A, respectively. -
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