Cite this article:
Wu Hua-Qiang, Wu Ming-Hao, Li Xin-Yi, Bai Yue, Deng Ning, Yu Zhi-Ping, Qian He. Asymmetric resistive switching processes in W:AlOx/WOy bilayer devicesJ. Chin. Phys. B, 2015, 24(5): 058501.
| Wu Hua-Qiang, Wu Ming-Hao, Li Xin-Yi, Bai Yue, Deng Ning, Yu Zhi-Ping, Qian He. Asymmetric resistive switching processes in W:AlOx/WOy bilayer devicesJ. Chin. Phys. B, 2015, 24(5): 058501. |
Asymmetric resistive switching processes in W:AlOx/WOy bilayer devices
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Abstract
Asymmetric resistive switching processes were observed in W:AlOx/WOy bilayer RRAM devices. During pulse programming measurements, the RESET speed is in the range of hundreds of microseconds under -1.1 V bias, while the SET speed is in the range of tens of nanoseconds under 1.2 V bias. Electrical measurements with different pulse conditions and different temperatures were carried out to understand these significant differences in switching time. A redox reaction model in the W:AlOx/WOy device structure is proposed to explain this switching time difference. -
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