Cite this article:
Wu Shuang-Hong, Ryosuke Nakamichi, Masatsugu Taneda, Zhang Qi-Sheng, Chihaya Adachi. Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentaceneJ. Chin. Phys. B, 2014, 23(9): 098502.
| Wu Shuang-Hong, Ryosuke Nakamichi, Masatsugu Taneda, Zhang Qi-Sheng, Chihaya Adachi. Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentaceneJ. Chin. Phys. B, 2014, 23(9): 098502. |
Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentacene
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Abstract
We introduced a dual electron accepting layer composed of tetrafluoro-tetracyanoquinodimethane (F4-TCNQ) and MoO3 for thermoelectric devices based on a pentacene layer. We found that the power factor is enhanced by placing an F4-TCNQ layer directly in contact with the pentacene layer and it is also enhanced by placing a MoO3 layer between the F4-TCNQ layer and the Au electrode. By examining the contact resistance using a field effect transistor and a hole-only diode, we confirmed that the hole injection is improved due to the reduction of contact resistance at the interface between the MoO3 layer and the Au electrode. -
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