Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Wu Shuang-Hong, Ryosuke Nakamichi, Masatsugu Taneda, Zhang Qi-Sheng, Chihaya Adachi. Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentaceneJ. Chin. Phys. B, 2014, 23(9): 098502.
    Wu Shuang-Hong, Ryosuke Nakamichi, Masatsugu Taneda, Zhang Qi-Sheng, Chihaya Adachi. Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentaceneJ. Chin. Phys. B, 2014, 23(9): 098502.
  • Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentacene

    • We introduced a dual electron accepting layer composed of tetrafluoro-tetracyanoquinodimethane (F4-TCNQ) and MoO3 for thermoelectric devices based on a pentacene layer. We found that the power factor is enhanced by placing an F4-TCNQ layer directly in contact with the pentacene layer and it is also enhanced by placing a MoO3 layer between the F4-TCNQ layer and the Au electrode. By examining the contact resistance using a field effect transistor and a hole-only diode, we confirmed that the hole injection is improved due to the reduction of contact resistance at the interface between the MoO3 layer and the Au electrode.
    • Article Text

    • loading

    Catalog

      /

      DownLoad:  Full-Size Img  PowerPoint
      Return
      Return