Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Li Da-Wei, Qin Jun-Rui, Chen Shu-Ming. Temperature dependence of single event transient in 90-nm CMOS dual-well and triple-well NMOSFETsJ. Chin. Phys. B, 2013, 22(2): 029401.
    Li Da-Wei, Qin Jun-Rui, Chen Shu-Ming. Temperature dependence of single event transient in 90-nm CMOS dual-well and triple-well NMOSFETsJ. Chin. Phys. B, 2013, 22(2): 029401.
  • Temperature dependence of single event transient in 90-nm CMOS dual-well and triple-well NMOSFETs

    • This paper investigates the temperature dependence of single event transient (SET) in 90-nm complementary metat-oxide semiconductor (CMOS) dual-well and triple-well negative metal-oxide semiconductor field-effect transistors (NMOSFETs). Technology computer-aided design (TCAD) three-dimensional (3D) simulations show that the drain current pulse duration increases from 85 ps to 245 ps for triple-well but only increases from 65 ps to 98 ps for dual-well when the temperature increases from -55℃ to 125℃, which is closely correlated with the source of NMOSFETs. This reveals that the pulse width increases with temperature in dual-well due to the weakening of anti-amplification bipolar effect while increases with temperature in triple-well due to the enhancement of the bipolar amplification.
    • Article Text

    • loading

    Catalog

      /

      DownLoad:  Full-Size Img  PowerPoint
      Return
      Return