Cite this article:
Li Da-Wei, Qin Jun-Rui, Chen Shu-Ming. Temperature dependence of single event transient in 90-nm CMOS dual-well and triple-well NMOSFETsJ. Chin. Phys. B, 2013, 22(2): 029401.
| Li Da-Wei, Qin Jun-Rui, Chen Shu-Ming. Temperature dependence of single event transient in 90-nm CMOS dual-well and triple-well NMOSFETsJ. Chin. Phys. B, 2013, 22(2): 029401. |
Temperature dependence of single event transient in 90-nm CMOS dual-well and triple-well NMOSFETs
-
Abstract
This paper investigates the temperature dependence of single event transient (SET) in 90-nm complementary metat-oxide semiconductor (CMOS) dual-well and triple-well negative metal-oxide semiconductor field-effect transistors (NMOSFETs). Technology computer-aided design (TCAD) three-dimensional (3D) simulations show that the drain current pulse duration increases from 85 ps to 245 ps for triple-well but only increases from 65 ps to 98 ps for dual-well when the temperature increases from -55℃ to 125℃, which is closely correlated with the source of NMOSFETs. This reveals that the pulse width increases with temperature in dual-well due to the weakening of anti-amplification bipolar effect while increases with temperature in triple-well due to the enhancement of the bipolar amplification. -
DownLoad: