Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Zhang Qian, Zhang Yu-Ming, Yuan Lei, Zhang Yi-Men, Tang Xiao-Yan, Song Qing-Wen. Fabrication and characterization of 4H–SiC bipolar junction transistor with double base epilayerJ. Chin. Phys. B, 2012, 21(8): 088502.
    Zhang Qian, Zhang Yu-Ming, Yuan Lei, Zhang Yi-Men, Tang Xiao-Yan, Song Qing-Wen. Fabrication and characterization of 4H–SiC bipolar junction transistor with double base epilayerJ. Chin. Phys. B, 2012, 21(8): 088502.
  • Fabrication and characterization of 4H–SiC bipolar junction transistor with double base epilayer

    • In this paper we report on a novel structure of 4H-SiC bipolar junction transistor with a double base epilayer that is continuously grown. The measured dc common-emitter current gain is 16.8 at IC=28.6 mA (JC=183.4 A/cm2), and it increases with the collector current density increasing. The specific on-state resistance (Rsp-on) is 32.3 mΩ·cm2 and the open-base breakdown voltage reaches 410 V. The emitter N-type specific contact resistance and N + emitter layer sheet resistance are 1.7× 10-3 Ω·cm2 and 150 Ω /□, respectively.
    • Article Text

    • loading

    Catalog

      /

      DownLoad:  Full-Size Img  PowerPoint
      Return
      Return