Cite this article:
Wang Zhi-Gang, Chen Wan-Jun, Zhang Jing, Zhang Bo, Li Zhao-Ji. Monolithic integration of AlGaN/GaN metal–insulator field-effect transistor with ultra-low voltage-drop diode for self-protectionJ. Chin. Phys. B, 2012, 21(8): 087305.
| Wang Zhi-Gang, Chen Wan-Jun, Zhang Jing, Zhang Bo, Li Zhao-Ji. Monolithic integration of AlGaN/GaN metal–insulator field-effect transistor with ultra-low voltage-drop diode for self-protectionJ. Chin. Phys. B, 2012, 21(8): 087305. |
Monolithic integration of AlGaN/GaN metal–insulator field-effect transistor with ultra-low voltage-drop diode for self-protection
-
Abstract
In this paper, we present a monolithic integration of self-protected AlGaN/GaN metal-insulator field-effect transistor (MISFET). An integrated field-controlled diode on the drain side of the AlGaN/GaN MISFET features self-protected function at reverse bias. This diode takes advantage of the recessed-barrier enhancement-mode technique to realize an ultra-low voltage drop and a low turn-ON voltage. In the smart monolithic integration, this integrated diode can block reverse bias (>70 V/μm) and suppress the leakage current (<5×10-11 A/mm). Compared with conventional monolithic integration, the numerical results show that the MISFET integrated with a field-controlled diode leads to a good performance for smart power integration. And the power loss is lower than 50% in conduction without forward current degeneration. -
DownLoad: