A nano-metallic-particles-based CMOS image sensor for DNA detection

In this paper we report on a study of the CMOS image sensor detection of the DNA based on the self-assembled nano-metallic particles, which are selectively deposited on the surface of passive image sensor. The nano-metallic particles block the optical radiation in the visible spectrum of ordinary light source effectively. When such a technical method is applied to the DNA detection, the requirement for special UV light source in the most popular fluorescence is eliminated. The DNA detection methodology is tested on a CMOS sensor chip fabricated using a standard 0.5 μm CMOS process. It is demonstrated that the approach is highly selective to detecting even signal-base mismatched DNA target with extremely-low-concentration DNA sample down to 10 pM under ordinary light source.