Print ISSN:1674-1056  |  Online ISSN:2058-3834  |  CN:11-5639/O4
  • Cite this article:

    Fu Xiao-Qian, Chang Ben-Kang, Wang Xiao-Hui, Li Biao, Du Yu-Jie, Zhang Jun-Ju. Photoemission of graded-doping GaN photocathodeJ. Chin. Phys. B, 2011, 20(3): 037902.
    Fu Xiao-Qian, Chang Ben-Kang, Wang Xiao-Hui, Li Biao, Du Yu-Jie, Zhang Jun-Ju. Photoemission of graded-doping GaN photocathodeJ. Chin. Phys. B, 2011, 20(3): 037902.
  • Photoemission of graded-doping GaN photocathode

    • We study the photoemission process of graded-doping GaN photocathode and find that the built-in electric fields can increase the escape probability and the effective diffusion length of photo-generated electrons, which results in the enhancement of quantum efficiency. The intervalley scattering mechanism and the lattice scattering mechanism in high electric fields are also investigated. To prevent negative differential mobility from appearing, the surface doping concentration needs to be optimized, and it is calculated to be 3.19×1017 cm-3. The graded-doping GaN photocathode with higher performance can be realized by further optimizing the doping profile.
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