Cite this article:
Chen Feng-Ping, Zhang Yu-Ming, Zhang Yi-Men, Tang Xiao-Yan, Wang Yue-Hu, Chen Wen-Hao. Edge termination study and fabrication of a 4H–SiC junction barrier Schottky diodeJ. Chin. Phys. B, 2011, 20(11): 117301.
| Chen Feng-Ping, Zhang Yu-Ming, Zhang Yi-Men, Tang Xiao-Yan, Wang Yue-Hu, Chen Wen-Hao. Edge termination study and fabrication of a 4H–SiC junction barrier Schottky diodeJ. Chin. Phys. B, 2011, 20(11): 117301. |
Edge termination study and fabrication of a 4H–SiC junction barrier Schottky diode
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Abstract
The 4H-SiC junction barrier Schottky (JBS) diodes terminated by field guard rings and offset field plate are designed, fabricated and characterized. It is shown experimentally that a 3-μm P-type implantation window spacing gives an optimum trade-off between forward drop voltage and leakage current density for these diodes, yielding a specific on-resistance of 8.3 mΩ·cm2. A JBS diode with a turn-on voltage of 0.65 V and a reverse current density less than 1 A/cm2 under 500 V is fabricated, and the reverse recovery time is tested to be 80 ns, and the peak reverse current is 28.1 mA. Temperature-dependent characteristics are also studied in a temperature range of 75 ℃-200 ℃. The diode shows a stable Schottky barrier height of up to 200 ℃ and a stable operation under a continuous forward current of 100 A/cm2. -
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