Cite this article:
Wu Zhi-Yong, Liu Ke-Xin, Ren Xiao-Tang. Mechanism and enhancement of photoluminescence from silicon nanocrystals implanted in SiO2 matrixJ. Chin. Phys. B, 2010, 19(9): 097806.
| Wu Zhi-Yong, Liu Ke-Xin, Ren Xiao-Tang. Mechanism and enhancement of photoluminescence from silicon nanocrystals implanted in SiO2 matrixJ. Chin. Phys. B, 2010, 19(9): 097806. |
Mechanism and enhancement of photoluminescence from silicon nanocrystals implanted in SiO2 matrix
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Abstract
Photoluminescence (PL) spectra of Si nanocrystals (NCs) prepared by 130 keV Si ions implantation onto SiO2 matrix were investigated as a function of annealing temperature and implanted ion dose. PL spectra consist of two PL peaks, originated from smaller Si NCs due to quantum confinement effect (QCE) and the interface states located at the surface of larger Si NCs. The evolution of number of dangling bonds (DBs) on Si NCs was also investigated. For hydrogen-passivated samples, a monotonic increase in PL peak intensity with the dose of implanted Si ions up to 3× 1017 ions /cm2 is observed. The number of DBs on individual Si NC, the interaction between DBs at the surface of neighbouring Si NCs and their effects on the efficiency of PL are discussed. -
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