Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33×10³—1.01×10⁵ Pa)) as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.