Far-field superlens for nanolithography

A far-field optical lithography is developed in this paper. By designing the structure of a far-field optical superlens, lithographical resolution can be improved by using a conventional UV light source. The finite different time domain numerical studies indicate that the lithographic resolution at 50~nm line width is achievable with the structure shown in this paper by using 365~nm wavelength light, and the light can be transferred to a far distance in the photoresist.