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  • Cite this article:

    Liu Ge, Liu Ming, Wang Hong, Shang Li-Wei, Ji Zhuo-Yu, Liu Xing-Hua, Liu Jiang. Study of top and bottom contact resistance in one organic field-effect transistorJ. Chin. Phys. B, 2009, 18(8): 3530-3534.
    Liu Ge, Liu Ming, Wang Hong, Shang Li-Wei, Ji Zhuo-Yu, Liu Xing-Hua, Liu Jiang. Study of top and bottom contact resistance in one organic field-effect transistorJ. Chin. Phys. B, 2009, 18(8): 3530-3534.
  • Study of top and bottom contact resistance in one organic field-effect transistor

    • This paper reports that the organic field-effect transistors with hybrid contact geometry were fabricated, in which the top electrodes and the bottom electrodes were combined in parallel resistances within one transistor. With the facility of the novel structure, the difference of contact resistance between the top contact geometry and the bottom contact geometry was studied. The hybrid contact devices showed similar characteristics with the top contact configuration devices, which provide helpful evidence on the lower contact resistance of the top contact configuration device. The origin of the different contact resistance between the top contact device and the bottom contact device was discussed.
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