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    Hu Wen-Juan, Xie Fen-Yan, Chen Qiang, Weng Jing. Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behavioursJ. Chin. Phys. B, 2009, 18(3): 1276-1282.
    Hu Wen-Juan, Xie Fen-Yan, Chen Qiang, Weng Jing. Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behavioursJ. Chin. Phys. B, 2009, 18(3): 1276-1282.
  • Amine-containing film deposited in pulsed dielectric barrier discharge at a high pressure and its cell adsorption behaviours

    • With monomer allylamine, amine-containing functional films were prepared in alternative current pulsed dielectric barrier discharge (DBD) at a high pressure. This paper analyses in detail the film properties and structures, such as hydrophilicity, compounds and microstructures as well as amine density by the water contact angle, Fourier transform infrared spectroscopy, atomic force microscopy, and ultraviolet--visible measurement. The influence of discharge parameters, in particular applied power, on amine density was investigated. As an application the cell adsorption behaviours on plasma polymerization films was performed in-vitro. The results show that at a high pressure pulsed DBD plasma can polymerize films with sufficient amine group on surface, through which the very efficient cell adsorption behaviours was demonstrated, and the high rate of cell proliferation was visualized.
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