Cite this article:
Sui Xiao-Hong, Zhang Ruo-Xin, Pei Wei-Hua, Chen Hong-Da. A novel implantable multichannel silicon-based microelectrodeJ. Chin. Phys. B, 2007, 16(7): 2116-2119.
| Sui Xiao-Hong, Zhang Ruo-Xin, Pei Wei-Hua, Chen Hong-Da. A novel implantable multichannel silicon-based microelectrodeJ. Chin. Phys. B, 2007, 16(7): 2116-2119. |
A novel implantable multichannel silicon-based microelectrode
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Abstract
Silicon-based microelectrodes have been confirmed to be helpful in neural prostheses. The fabricated 7-channel silicon-based microelectrode was feasible to be implanted into the brain cortex. The manufacturing process by micro-electromechanical system (MEMS) technology was detailed with four photolithographic masks. The microscopic photographs and SEM images indicated that the probe shank was 3mm long, 100\mum wide and 20\mu m thick with the recording sites spaced 120\mu m apart for good signal isolation. To facilitate the insertion and minimize the trauma, the microelectrode is narrowed down gradually near the tip with the tip taper angle of 6 degrees. Curve of the single recording site impedance versus frequency was shown by test in vitro and the impedance declined from 150.5k\Omega to 6.0k\Omega with frequency changing from 10 k to 10MHz. -
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