Cite this article:
Huang Song, Xin Yu, Ning Zhao-Yuan. Study of effect of H2 addition on the production of fluorocarbon radicals in H2C4F8 inductively coupled plasma via optical emission spectroscopy actinometryJ. Chin. Phys. B, 2005, 14(8): 1608-1612.
| Huang Song, Xin Yu, Ning Zhao-Yuan. Study of effect of H2 addition on the production of fluorocarbon radicals in H2C4F8 inductively coupled plasma via optical emission spectroscopy actinometryJ. Chin. Phys. B, 2005, 14(8): 1608-1612. |
Study of effect of H2 addition on the production of fluorocarbon radicals in H2C4F8 inductively coupled plasma via optical emission spectroscopy actinometry
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Abstract
C4F8 plasma with the addition of H2 is generated by the inductively coupled plasma (ICP) method. The relative densities of CF,CF2, H and F radicals are determined by actinometric optical emission spectroscopy (AOES) as a function of the gas flow rate ratio R=H2/(H2+C4F8 at a pressure of 0.8 Pa and an input r.f.power of 400W, while that of HF is measured by quadrupole mass spectrometry (QMS). The results show that plasma activity increases firstly and then decreases with increasing R. As the gas flow rate ratio R changes from 0 to 0.625, relative densities of both CF and CF2 decrease, and the relative CF has a similar tendency as the calculated CF, indicating that CF radicals are generated mainly by the electron impact dissociation of CF2 radicals. Production of HF is also discussed. -
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