Cite this article:
Ouyang Jian-Ming, Guo Wei, Wang Long, Shao Fu-Qiu. Numerical simulation of chemical processes in helium plasmas in atmosphere environmentJ. Chin. Phys. B, 2005, 14(1): 154-158.
| Ouyang Jian-Ming, Guo Wei, Wang Long, Shao Fu-Qiu. Numerical simulation of chemical processes in helium plasmas in atmosphere environmentJ. Chin. Phys. B, 2005, 14(1): 154-158. |
Numerical simulation of chemical processes in helium plasmas in atmosphere environment
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Abstract
A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period. -
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