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  • Cite this article:

    Wang Jiu-Li, Zhang Gu-Ling, Liu Yuan-Fu, Wang You-Nian, Liu Chi-Zi, Yang Si-Ze. Influence of ion species ratio on grid-enhanced plasma source ion implantationJ. Chin. Phys. B, 2004, 13(1): 65-70.
    Wang Jiu-Li, Zhang Gu-Ling, Liu Yuan-Fu, Wang You-Nian, Liu Chi-Zi, Yang Si-Ze. Influence of ion species ratio on grid-enhanced plasma source ion implantationJ. Chin. Phys. B, 2004, 13(1): 65-70.
  • Influence of ion species ratio on grid-enhanced plasma source ion implantation

    • Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N_2^+ and atomic ions N^+ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N_2^+ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N^+ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.
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