Cite this article:
Xu Jun, Huang Xiao-Hui, Li Wei, Wang Li, Chen Kun-Ji. Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing methodJ. Chin. Phys. B, 2002, 11(5): 502-505.
| Xu Jun, Huang Xiao-Hui, Li Wei, Wang Li, Chen Kun-Ji. Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing methodJ. Chin. Phys. B, 2002, 11(5): 502-505. |
Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing method
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Abstract
A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layer method) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemical vapour deposition system. It was found that the hydrogen plasma treatment could decrease the hydrogen concentration in the films and change the sp2/sp3 ratio to some extent by chemical etching. Blue photoluminescence was observed at room temperature, as a result of the reduction of sp2 clusters in the films. -
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