Stress and strain analysis of Si-based III – V template fabricated by ion-slicing

Zhao Shuyan^{1, 2}, Song Yuxin¹, Liang Hao^{1, 2}, Jin Tingting^{1, 2}, Lin Jiajie^{1, 2}, Yue Li^{1, 2}, You Tiangui^{1, 2}, Wang Chang^{1, 2}, Ou Xin^{1, 2, †}, Wang Shumin^{1, 2, 3, ‡}

(a) Optical microscope photo of a structure B2 sample surface close to the sample edge showing delamination after deoxidation at about 600°C. (b) SEM image of the same sample cleaved through one of the delamination regions and panel (c) is a zoomed-in image at the corner with the layers labeled.